The M series optical emission spectrometer adopt international standard design and manufacturing process technology, full digital combines with internet technology, and using high resolution CMOS detector, the precisely designed argon purge system to guarantee instruments with higher performance, lower cost and extremely competitive price.
M4 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Al, Mg). It is an ideal solution to quick analysis near the furnace, metal material quality analysis and research laboratories. This also gives the user a truly portable spectrometer that’s both easy to use and easy to space saved.
Testing Laboratories: Commercial testing laboratories, Universities and colleges
Rolling mills, foundries, workshops: Rapid analysis; test several 100s of samples daily
Alloy manufacturers: Any number of bases / matrices; highly stable and precise
Medium-sized industries: Extremely rugged and economical; low cost / analysis
Foundries which need a quick analysis near the furnace
Warehouse material identification
Base: Fe, Al, Mg
Precise reliable, fast, versatile and affordable
Compact designed desktop unit
Energy saving, standby power 50VA,
The light chamber filled with argon in place of vacuum system .
High resolution CMOS detector can achieve full spectrum analysis.
Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.
Wavelength range 165nm~580nm(extendable), spectral lines can cover all important elements
Highly sensitive UV detection with the precisely argon purge system, it is accurate for N analysis to analyze.
Spectrometer temperature control ensuring high precision and stability
Programmable digitalized spark source, generating optimized discharge waveform for different bases.
Advanced excitation protection and diagnostic system ensuring operating safety
Argon purge control protecting entrance lens form contaminating, minimizing maintenance
Professional data capture, improved accuracy by reducing background interference
Global factory calibration with interference correction
Technology support and software update for free.
High resolution CMOS Multi detectors
Argon cycle filling
First order spectral line dispersion rare
Average resolution ratio
Light chamber temperature is controlled automatically
Digital arc and spark source
Optimization of discharge parameters design
High energy precombustion technology HEPS
High-speed data synchronization acquisition and processing
Tungsten electrode technology
Thermal deformation self-compensation design
Argon flushed with minimal consumption of Argon
Spray discharge electrode technology
Adjustable electrode technology
5℃-40℃, 23±2℃ is recommended
99.999%, Argon pressure>4Mpa
5L/min during spark mode
Ethernet data transmission based on DM9000A
GIVE US A MESSAGE