M4 OES Optical Emission Spectrometer

Summary:

The M series optical emission spectrometer adopt international standard design and manufacturing process technology, full digital combines with internet technology, and using high resolution CMOS detector,  the precisely designed argon purge system to guarantee instruments with higher performance, lower cost and extremely competitive price.

M4 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, etc ). It is an ideal solution to quick analysis near the furnace, metal material quality analysis and research laboratories.

This also gives the user a truly portable spectrometer that’s both easy to use and easy to space saved.

Applications:

Large Steel Plants Where needs are at around 100 PPM levels or elements like C, N, Cr, S, P etc.

Testing Laboratories: Commercial testing laboratories, Universities and colleges

Regulatory compliance Very low LODs to control Pb, Cd, As etc.

Foundries which need a quick analysis near the furnace

Manufacturing Facilities

Warehouse material identification

Base: Fe, Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, etc

Features:

Precise reliable, fast, versatile and affordable

Compact designed desktop unit

Energy saving, standby power 50VA,

The light chamber filled with argon in place of vacuum system .                                        

High resolution CMOS detector can achieve full spectrum analysis.

Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.

Wavelength range 165nm~580nm(extendable), spectral lines can cover all important elements

Highly sensitive UV detection with the precisely argon purge system, it is accurate for N analysis to analyze.

Spectrometer temperature control ensuring high precision and stability

Programmable digitalized spark source, generating optimized discharge waveform for different bases.

Advanced excitation protection and diagnostic system ensuring operating safety

Argon purge control protecting entrance lens form contaminating, minimizing maintenance

Professional data capture, improved accuracy by reducing background interference

Global factory calibration with interference correction

Technology support and software update for free.

Base

Available for the relevant bases such as Fe, Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, etc.

Optical System

Argon cycle method

Raster focal length 300mm.

Paschen-Runge optical system with full wavelength coverage

Effective wavelength range 165nm~580mn(extendable)

Multi-CMOS detectors with high resolution

The light chamber filled with argon in place of complex vacuum system 

Calibration

Standard factory calibrated programs

Freely selected analysis programs

Customized calibrated programs according to individual requirements

Spark Stand

Argon flushed and optimized argon flow

Easily operated sample clamp adapted to different sample geometrics

Durable electrode and easy maintenance

Easy operated small sample clamp

Readout system

High performance DSP and FPGA processor with super high speed

External PC optional

Ethernet data transmission

Internet network technology and data cloud storage.

Excitation Source 

Programmable pulse digital source

Optimized electronics and complete excitation protection

Available spark, arc and combined discharge waveform for different bases]

High-energy pre-spark

Frequency: 100Hz~1000Hz

Maximum discharge current:400A

Software

Easy used and graphic interface based on Windows

Automatic diagnosis system

Database management

Microsoft Windows operating system

The perfect database management function can easy to inquire and summary data.

Intelligent correction algorithm can keep the instrument stable and reliable.

Electrical and Environmental Requirement

AC220±20VA, 50HZ

Max 400VA in sparking

Average standby power 50VA

Room temperature: 10℃~35℃

Relative humidity:20%~80%

Dimension

L * W * H: 734*578*280 mm

Net weight: 40kg