Low total cost of ownership
Vacuum-free optics with fast stabilization
Unmatched analytical performance and reliability
Excellent long-term stability
Easy to use with full PC control
Compact design, small size.
Maximum 20 elements
Summary:
The M4 Optical Emission Spectrometer adopt international standard design and manufacturing process technology, full digital combines with internet technology, and using high resolution CMOS detector, the precisely designed argon purge system to guarantee instruments with higher performance, lower cost and extremely competitive price.
M4 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Al, Mg). It is an ideal solution to metal processing control and chemical analysis, metal material quality analysis and research laboratories. It is cost-effective and does not require a vacuum system. If the customer want high cost effective and the test is infrequent, the M4 OES will be a good choice.
Applications:
Testing Laboratories: Commercial testing laboratories, Universities and colleges
Alloy manufacturers: metal processing control and chemical analysis
Medium-sized industries: Extremely rugged and economical; low cost / analysis
Foundries which need a quick analysis near the furnace
Manufacturing Facilities
Warehouse material identification
Base: Fe, Al, Mg
Features:
Precise reliable, fast, versatile and affordable
Compact designed desktop unit
Energy saving, standby power 50VA,
The light chamber filled with argon in place of vacuum system .
High resolution CMOS detector can achieve full spectrum analysis.
Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.
Wavelength range 165nm~580nm(extendable), spectral lines can cover all important elements
Highly sensitive UV detection with the precisely argon purge system,
Spectrometer temperature control ensuring high precision and stability
Programmable digitalized spark source, generating optimized discharge waveform for different bases.
Advanced excitation protection and diagnostic system ensuring operating safety
Argon purge control protecting entrance lens form contaminating, minimizing maintenance
Professional data capture, improved accuracy by reducing background interference
Global factory calibration with interference correction
Technology support and software update for free.
Low total cost of ownership
Vacuum-free optics with fast stabilization
Unmatched analytical performance and reliability
Excellent long-term stability
Easy to use with full PC control
Compact design, small size.
Maximum 20 elements
Water-soluble metallographic grinding paste is a polishing and grinding product that is finely formulated with diamond powder, grinding aids and dispersant materials. It also eliminates the difficulty in cleaning after polishing caused by oily abrasive paste in the past, and the unclear surface of the sample. Water-soluble diamond abrasive paste can quickly achieve the ideal finish after polishing, greatly improving experimental efficiency.
Abrasive Paper is made of imported latex paper base and strictly graded silicon carbide abrasive processed by electrostatic sand planting process. The product has the characteristics of good water resistance, strong grinding and excellent wear resistance. Pressure sensitive adhesive sandpaper with advanced transparent double-sided tape, no residue, more convenient to use.
Material: Polyester striped conductive silk
Dust-proof and anti-static
High-temperature sterilization resistant
In accordance of international Class 1000 cleanroom standards
Thickened, large zipper for increased durability
Complies with technical cleanliness cleanroom standards
The fastest handheld XRF analyzer.
Grade identification in 1 second for any metal.
Full chemistry testing in 3-5 seconds for stainless steel and other alloys.
Full chemistry testing in 7-8 seconds for aluminium alloy.
Dustproof and waterproof
Strong, stretch-resistant, and wear-resistant
5mm extended edge banding with crack-resistant cutouts
Made of high-quality plastic
Suitable for VDA19 technical cleanliness analysis laboratories
Simultaneous ICP-OES for elemental analysis of liquids
Wavelength range:195-800nm
For 70 trace elements and macroelements
Analyze up to 600 samples per day
Low operating costs
Intuitive operation
Ultra-low limits of detection
Ultra-high speed of measurement
According to the customer's technical cleanliness testing requirements, we customize the corresponding cleaning methods, including pressure rinsing, ultrasonic, internal rinsing, shaking rinsing, and air blowing, so as to achieve the particles extraction of parts and components.
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