Low total cost of ownership
Vacuum-free optics with fast stabilization
Unmatched analytical performance and reliability
Excellent long-term stability
Easy to use with full PC control
Compact design, small size.
Maximum 20 elements
Summary:
The M4 Optical Emission Spectrometer adopt international standard design and manufacturing process technology, full digital combines with internet technology, and using high resolution CMOS detector, the precisely designed argon purge system to guarantee instruments with higher performance, lower cost and extremely competitive price.
M4 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Al, Mg). It is an ideal solution to metal processing control and chemical analysis, metal material quality analysis and research laboratories. It is cost-effective and does not require a vacuum system. If the customer want high cost effective and the test is infrequent, the M4 OES will be a good choice.
Applications:
Testing Laboratories: Commercial testing laboratories, Universities and colleges
Alloy manufacturers: metal processing control and chemical analysis
Medium-sized industries: Extremely rugged and economical; low cost / analysis
Foundries which need a quick analysis near the furnace
Manufacturing Facilities
Warehouse material identification
Base: Fe, Al, Mg
Features:
Precise reliable, fast, versatile and affordable
Compact designed desktop unit
Energy saving, standby power 50VA,
The light chamber filled with argon in place of vacuum system .
High resolution CMOS detector can achieve full spectrum analysis.
Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.
Wavelength range 165nm~580nm(extendable), spectral lines can cover all important elements
Highly sensitive UV detection with the precisely argon purge system,
Spectrometer temperature control ensuring high precision and stability
Programmable digitalized spark source, generating optimized discharge waveform for different bases.
Advanced excitation protection and diagnostic system ensuring operating safety
Argon purge control protecting entrance lens form contaminating, minimizing maintenance
Professional data capture, improved accuracy by reducing background interference
Global factory calibration with interference correction
Technology support and software update for free.
Low total cost of ownership
Vacuum-free optics with fast stabilization
Unmatched analytical performance and reliability
Excellent long-term stability
Easy to use with full PC control
Compact design, small size.
Maximum 20 elements
CMOS-based, spark discharge, optical emission spectrometer
Multi-bases, full spectrum analysis for utmost elemental flexibility
Ultra-low limits of detection
Wavelength range:130nm-800nm, maximum 30+ elements
Long-term stability and repeatability
Excellent vertical optical emission spectroscopy
Vacuum gauge to monitor the vacuum status in real time
Ultra-low carbon, low nitrogen analysis
Small sample analysis applications
Fe-based Certified Reference Materials
Ni-Based Certified Reference Materials
Cu-Based Certified Reference Materials
Al-Based Certified Reference Materials
Mg-Based Certified Reference Materials
Sn-Based Certified Reference Materials
Pb-Based Certified Reference Materials
JYBO CleanTech cleanliness inspection process fully adheres to international cleanliness standards, including VDA19, ISO16232, and other industry standards.
JYBO CleanTech cleanliness laboratory is capable of Class 1000 cleanroom operation, and its Class 100 operation chamber.
Because polishing is such a critical step in sample preparation, it’s important to choose a high quality polishing cloth. Our metallographic polishing cloth pads are thoroughly testedto provide a complete solution that delivers reliable results for each sample processed.
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
Simultaneous ICP-OES for elemental analysis of liquids
Wavelength range:195-800nm
For 70 trace elements and macroelements
Analyze up to 600 samples per day
Low operating costs
Intuitive operation
Ultra-low limits of detection
Ultra-high speed of measurement
Carried Standards: VDA19, ISO16232, NAS1638, ISO4406 and other standards.
Analysis Time: Less than 5 minutes.
Particle Size: ≥5um
Particle Height: Particle height can be measured.
Focus Mode: Automatic focus, no human intervention.
Repetition Accuracy: Above 99% (membrane scanned repeatedly for 10 times)
Scanning Mode: Aotomatic scanning
Particles Identify: Metallic particles, non-metallic particles, fibers.
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