The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
High resolution CMOS readout system
Low total cost of ownership
Vacuum optics enabling fast stabilization
Excellent long-term stability
Intelligent design, Modular design
Ferrous and non-ferrous applications
Easy to use with full PC control
Friendly user interface
High resolution CMOS readout system
Low total cost of ownership
Vacuum optics enabling fast stabilization
Excellent long-term stability
Intelligent design, Modular design
Ferrous and non-ferrous applications
Easy to use with full PC control
Friendly user interface
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
Accurate, Fast, Non-Destructive, Straightforward, Environmentally Protective
For the elements in the range of Na-U
Halogen-free testing, ROHS/ELV testing
Coating thickness measurement
Identification of jewelry, precious stones, precious metals
Master the unknown material
Outstanding sensitivity leads to up to a factor 3 improved precision
Low measurement cost, easy to operate
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