The M series optical emission spectrometer adopt international standard design and manufacturing process technology, full digital combines with internet technology, and using high resolution CMOS detector, the precisely designed argon purge system to guarantee instruments with higher performance, lower cost and extremely competitive price.
M2 Spectrometer is most suitable instrument for the determination of various elements in Aluminum matrices. In 1000-7000 series Aluminum production or Al-Si, Al-Si-Mg, Al-Si-Cu, Al-Mg series, a fully or even partially automated analysis results in a cost reduction. This also gives the user a truly portable spectrometer that’s both easy to use and easy to space saved.
Die-casting, forging, workshops: Rapid analysis; test several 100s of samples daily
Alloy manufacturers: Most of Al bases / matrices; highly stable and precise
Medium-sized industries: Extremely rugged and economical; low cost / analysis
Warehouse material identification
Extremely competitive price
Smaller, lightweight, exquisite, reliable instrument.
Energy saving, standby power 50VA,
Light chamber filled with argon in place of complex vacuum system, No vacuum pump
High resolution COMS detector can achieve full spectrum analysis.
Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.
Wavelength range 165nm~580mn, spectral lines can cover all important elements Compact, rugged and flexible to Al base and matrices
The smaller designed optical chamber structure and the optimized design of argon purge system can ensure transmission rate of elemental lines in UV area.
Spectrometer temperature control ensuring high precision and stability
Programmable digitalized spark source, generating optimized discharge waveform for Al base.
Professional data capture, improved accuracy by reducing background interference
Global factory calibration with interference correction
|Optical System||Focal Length||150mm|
|Detector||High resolution CMOS Multi detectors|
|Light chamber||Argon filling|
|First order spectral line dispersion rare||1.2nm/mm|
|Average resolution ratio||10pm/pixel|
|Light room temperature is controlled automatically|
|Spark Source||Type||Digital arc and spark source|
|Excitation light||Optimization of discharge parameters design|
|High energy precombustion technology HEPS|
|Processor||High-speed data synchronization acquisition and processing|
|Spark Stand||Electrode||Tungsten electrode technology|
|Make up||Thermal deformation self-compensation design|
|Argon flushed with minimal consumption of Argon|
|Spray discharge electrode technology|
|Adjustable electrode technology|
|Others||Measurable elements||Fe、Al、Cu、Ni、Ti、Co、Zn、Sn、Mg、Pb etc|
|Operating temperature||5℃-40℃, 23±2℃ is recommended|
|Power consumption||Excitation:400W/Stand by:50W|
|Argon quality||99.999%, Argon pressure>4Mpa|
|Argon consumption||5L/min during spark mode|
|Interface||Ethernet data transmission based on DM9000A|
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